Solutions for the Performance Boundaries of Large-Aperture Spherical Lenses Abstract In the era of rapid advances in optoelectronic technology, large-aperture spherical lenses act as the “core pupil” of modern optical systems. Their performance determines the imaging precision and beam-control capability of high-end equipment—from deep-space telescopes to nanoscale lithography systems. Achieving nanoscale surface accuracy on millimeter-scale […]
Key Takeaways Lithography systems are vital for precise circuit patterning in semiconductor manufacturing. Exposure methods like contact/proximity and projection are utilized to produce desired patterns. Accurate alignment via global/local marks and interferometry is crucial, and the light sources used dictate resolution. Extreme Ultraviolet Light (EUV) enables production of the finest features. Innovations in lithography are […]
Microlens arrays with microlenses are essential for optimizing light distribution in laser and fiber applications.
