NIR Microscopy: Applications and Design Challenges in the 780–2500nm Range

Near-infrared (NIR) microscopy objectives (780–2500nm) are essential for “seeing through” opaque barriers.
By balancing high resolution with superior penetration, they enable deep-tissue biological imaging, subsurface semiconductor defect detection, and non-destructive material analysis.
Despite design challenges like specialized material selection (ZnS/Germanium) and complex aberration correction, modern NIR optics provide high-transmittance solutions (≥ 85%) that surpass the physical limits of visible light, driving innovation in both high-tech manufacturing and life sciences.

Read more
Optical Path Optimization: System Integration through Precision Telecompressor Technology

Key Takeaways The Precision Telecompressor optimizes optical systems by intelligently mapping full-frame lens performance onto smaller industrial sensors. By compressing the image field, it restores the native field of view and concentrates luminous flux, providing a one-stop aperture gain and improved Signal-to-Noise Ratio (SNR). This engineering solution enhances MTF (resolution density) and compensates for sensor-lens […]

Read more
Precision Manufacturing of Large-Aperture Spherical Lenses
large-aperture spherical lens, optical precision, lens manufacturing, ion beam polishing, magnetorheological finishing, interferometry optics, semiconductor lithography lens

Solutions for the Performance Boundaries of Large-Aperture Spherical Lenses Abstract In the era of rapid advances in optoelectronic technology, large-aperture spherical lenses act as the “core pupil” of modern optical systems. Their performance determines the imaging precision and beam-control capability of high-end equipment—from deep-space telescopes to nanoscale lithography systems. Achieving nanoscale surface accuracy on millimeter-scale […]

Read more
Understanding Semiconductor Lithography

Key Takeaways Lithography systems are vital for precise circuit patterning in semiconductor manufacturing. Exposure methods like contact/proximity and projection are utilized to produce desired patterns.  Accurate alignment via global/local marks and interferometry is crucial, and  the light sources used dictate resolution.  Extreme Ultraviolet Light (EUV) enables production of the finest features. Innovations in lithography are […]

Read more